Descrizione
Deposition: E-Beam Evaporation – PECVD – SPUTTERING – THERMAL Evaporation
Etching: Reactive ION Etching – Deep Reactive ION Etching – ION Bean Milling
Growth: ALD – Plasma MOCVD – MOCVD – DIAMOND growth system
Cleaning: Wet/Dry cleaning – Plasma cleaning and ashing
Dual System: Dual chamber system – Auto Wafer Transfer System
Space simulation for Satellite – Minisatellite – Microsatellite for testing devices in extreme vacuum 7×10-8 Torr and could reach 10-6 Torr range in less than 20 minutes.and controllable uniform heat and cold cycle conditions (100 °C to 150 °C)
Visita Il Sito Internet Clicca Qui
